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Magnetron Sputtering Mask
Product Introduction:
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The mask (also known as a photomask or reticle) is one of the most critical core process equipment in industries such as semiconductor manufacturing, flat panel displays (FPDs), and microelectromechanical systems (MEMS). Its precision directly determines the performance and yield of the final product (chips, screens). During the photolithography process, light passes through the mask, shrinking the precise circuit pattern on it like a "projection" and replicating it onto a silicon wafer or glass substrate coated with photoresist. -
Lithography Machine Filter
The photolithography filter is mainly used for precise filtration of particles in gas or liquid. At the same time, with the high strength of stainless steel and the high precision of laser cutting, it ensures long-term stable operation in harsh environments (such as high temperature and corrosion) and protects the core components of the photolithography machine from contamination.
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